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KMID : 1011420100150040299
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Journal of Korean Ophthalmic Optics Society
2010 Volume.15 No. 4 p.299 ~ p.305
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The Electrical and Optical Characteristics of ATO Films Preparedby RF Magnetron Sputtering Method
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Kang Sung-Soo
Lee Sung-Ho
Jang Yoon-Seok
Park Sang-Chul
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Abstract
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Purposes: The purposes of this study were to investigate the optical, structural and electrical properties of the antimony doped tin oxide(ATO) thin films according to certain variable deposition conditions, such as RF input power and T-S (target-substrate) distance change, using transparent conducting oxide (TCO).
Methods: ATO thin films of Sb concentration ratio with SnO2:Sb2O5=95:5 wt% were deposited at room temperature by RF magnetron sputtering method.
Results: ATO thin films were most sensitive to the RF input power: light transmittance was 78% at RF input power of 30W, and 0.56 nm for the surface roughness and 1007 W톍m-2 for the sheet resistance as well.
Conclusions: It was found that ATO thin films were showed the large change in its characteristics of structural, optical and electrical properties which were affected by T-S distance and RF input power.
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KEYWORD
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Antimony doped tin oxide (ATO), RF magnetron sputtering, sheet resistance, deposition rate, transmittance, roughness
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